Total toxicity equivalents emissions of SF6, CHF3, and CCl2F2 decomposed in a RF plasma environment

Ya Fen Wang, Minliang Shih, Cheng Hsien Tsai, Perng Jy Tsai

研究成果: Article同行評審

18 引文 斯高帕斯(Scopus)

摘要

Sulfur hexafluorine compound (SF6), trifluoromethane (CHF 3) and diclorodifluoromethane (CCl2F2) are extensively used in the semiconductor industry. They are global warming gases. Most studies have addressed the effective decomposition of fluorine compounds, rather than the toxicity of decomposed by-products. Hence, the concepts of toxicity equivalents (TEQs) were applied in this work. The results indicated that HF and SiF4 were the two greatest contributors of TEQ to the SF6/H2/Ar plasma system, while F2 and SiF 4 were the two greatest contributors to the SF6/O 2/Ar system. Additionally, SiF4 and HF were the two greatest contributors of TEQ to both the CHF3/H2/Ar and CHF3/O2/Ar plasma systems. HF and HCl were the two greatest contributors of TEQ to the CCl2F2/H 2/Ar plasma system, and Cl2 and COCl2 were the two greatest contributors to the CCl2F2/O2/Ar system. HCl and HF can be recovered using wet scrubbing, which reduces the toxicity of these emission gases. Consequently, the hydrogen-based plasma system was a better alternative for treating gases that contained SF6, CHF3 and CCl2F2 from the TEQs point of view.

原文English
頁(從 - 到)1681-1688
頁數8
期刊Chemosphere
62
發行號10
DOIs
出版狀態Published - 2006 3月

All Science Journal Classification (ASJC) codes

  • 環境工程
  • 環境化學
  • 化學 (全部)
  • 污染
  • 健康、毒理學和誘變

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