Transport study of a single bismuth nanowire fabricated by the silver and silicon nanowire shadow masks

  • D. S. Choi
  • , A. A. Balandin
  • , M. S. Leung
  • , G. W. Stupian
  • , N. Presser
  • , S. W. Chung
  • , J. R. Heath
  • , A. Khitun
  • , K. L. Wang

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36 引文 斯高帕斯(Scopus)

摘要

The authors have carried out measurements of the electrical conductivity of single bismuth nanowires fabricated by the low energy electron beam lithography using the silver/silicon nanowire shadow masks. The examined nanowires had cross-sectional dimensions of 40×30 and 40×50 nm2. The chosen nanowire sizes had been slightly below the critical diameter D (∼50 nm) at which a semimetal to semiconductor phase transition was predicted to occur. The results reveal a semiconductorlike temperature dependence of the electrical conductivity of a bismuth nanowire, which is strikingly different from that of the bulk bismuth.

原文English
文章編號141503
期刊Applied Physics Letters
89
發行號14
DOIs
出版狀態Published - 2006

All Science Journal Classification (ASJC) codes

  • 物理與天文學(雜項)

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