Trap Profile and Bias Temperature Instability of ALD-HfSiON Gate Stacks in Advanced MOSFETs

Shui-Jinn Wang, C. K Chiang, Y. H. Chen, N. C. Su, C. C Huang, H.Y. Huang, C.-H. Wu

研究成果: Conference contribution

原文English
主出版物標題International Conference on Solid State Device and materials (SSDM’09)
出版地Sendai, Japan
出版狀態Published - 2009 十月 7

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