TY - JOUR
T1 - UV-C Light Detection in Aluminum Gallium Oxide Metal–Semiconductor–Metal Photodetectors
AU - Liao, Tsung I.
AU - Chang, Sheng-Po
AU - Chang, Shoou Jinn
N1 - Publisher Copyright:
© MYU K.K. This work is licensed under a Creative Commons Attribution 4.0 International License.
PY - 2025
Y1 - 2025
N2 - In this work, we fabricated aluminum gallium oxide (AGO) metal–semiconductor–metal photodetectors (PDs) with different RF powers of Ga2O3 target (PGa), and their characteristics were investigated and discussed. At PGa below 160 W, the PDs exhibited high resistance across the whole range of wavelengths. When PGa increases to 160 W or higher, both the response and rejection ratio improve significantly. The optimal photoresponse occurs when the DC power of Al is 80 W and PGa is 180 W, with the rejection ratio about 105, the responsivity 0.2 mA/W, the rise time less than 1 s, and the decay time less than 0.1 s. Additionally, the optimal AGO PDs have high stability and repeatability demonstrated in the time-resolved response.
AB - In this work, we fabricated aluminum gallium oxide (AGO) metal–semiconductor–metal photodetectors (PDs) with different RF powers of Ga2O3 target (PGa), and their characteristics were investigated and discussed. At PGa below 160 W, the PDs exhibited high resistance across the whole range of wavelengths. When PGa increases to 160 W or higher, both the response and rejection ratio improve significantly. The optimal photoresponse occurs when the DC power of Al is 80 W and PGa is 180 W, with the rejection ratio about 105, the responsivity 0.2 mA/W, the rise time less than 1 s, and the decay time less than 0.1 s. Additionally, the optimal AGO PDs have high stability and repeatability demonstrated in the time-resolved response.
UR - https://www.scopus.com/pages/publications/105016903260
UR - https://www.scopus.com/pages/publications/105016903260#tab=citedBy
U2 - 10.18494/SAM5732
DO - 10.18494/SAM5732
M3 - Article
AN - SCOPUS:105016903260
SN - 0914-4935
VL - 37
SP - 3651
EP - 3660
JO - Sensors and Materials
JF - Sensors and Materials
IS - 8
ER -