A 8 GHz surface acoustic wave (SAW) filter was fabricated by UV nanoimprint lithography (UV-NIL). The key techniques to produce SAW filter include stamp and interdigital transducer (IDT). For stamp, high aspect ratio HSQ/ITO/glass stamp was first exposed by low dose e-beam writer and the proper post-exposure bake (PEB) temperature. The suitable TMAH concentration, temperature, and etching time were utilized to pattern perfect vertical sidewall of the HSQ stamp. Afterwards, the pattern was transferred on UV-curable resist / LiNbO 3 by UV-NIL at room temperature and low pressure. Al/Ti IDTs were then deposited on LiNbO3 for lift-off process. IDTs with feature size 100nm and thickness 20nm can be obtained. Central frequency of SAW filter is as high as 8 GHz. The SEM images depict the fabricated stamps, imprinted features and Al/Ti IDTs. Network analyzer HP8510C was used to examine electrical characterization of SAW filter.