摘要
GaN ultraviolet photodiodes with (i.e. sample 1) and without (i.e. sample 2) Mg-doped AlGaN/GaN strained-layer superlattice structure were both fabricated. It was found that we could achieve a near constant dark current of around 3 and 7 nA/cm2 for sample 1 and sample 2, respectively. It was also found that we could achieve a larger photocurrent and a larger photocurrent to dark current contrast ratio from sample 1. The zero-bias peak responsivity was found to be around 0.05 A/W at 356 nm and 0.006 A/W at 363 nm for sample 1 and sample 2, respectively. However, the transient response full-width-half-maximum (FWHM) of sample 1 was found to be longer. For devices with a 500 μm diameter, it was found that the transient response FWHM was 0.6 μs for sample 1 and 0.2 μs for sample 2. The difference in response time between sample 1 and sample 2 should be attributed to the distribution of depletion layer in between the p-layer and the n-type i-layer.
| 原文 | English |
|---|---|
| 頁(從 - 到) | 873-878 |
| 頁數 | 6 |
| 期刊 | Solid-State Electronics |
| 卷 | 47 |
| 發行號 | 5 |
| DOIs | |
| 出版狀態 | Published - 2003 5月 |
All Science Journal Classification (ASJC) codes
- 電子、光磁材料
- 凝聚態物理學
- 電氣與電子工程
- 材料化學
指紋
深入研究「Visible-blind GaN p-i-n photodiodes with an Al0.12Ga0.88N/GaN superlattice structure」主題。共同形成了獨特的指紋。引用此
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