Wavefront aberration determination in non-axially symmetrical optical systems

研究成果: Article同行評審

摘要

Non-axially symmetrical optical systems can provide better solutions to several optical design problems. However, determining their wavefront aberrations is challenging due to the great diversity of their configurations. Accordingly, in the present study, the optical path length (OPL) between two boundaries in a non-axially symmetrical system is expanded by a Taylor series expansion with respect to the base ray. This expansion converts the OPL from a deep composite function to a polynomial form. The various order wavefront aberrations are then obtained from the coefficients of the polynomials in terms of the system independent variables. The proposed method is equally valid for axially symmetrical systems provided that the object is placed on the meridional plane. Overall, the method provides a systematic approach for analyzing the wavefront aberrations in a wide range of optical systems.

原文English
頁(從 - 到)674-685
頁數12
期刊Journal of the Optical Society of America A: Optics and Image Science, and Vision
41
發行號4
DOIs
出版狀態Published - 2024 4月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 電腦視覺和模式識別

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