摘要
For the first time, indium-tin-oxide (ITO) layers were deposited onto n-ZnMgSSe films by DC magnetron sputtering and ZnMgSSe metal-semiconductor-metal (MSM) photodetectors Were fabricated. The Schottky barrier height of ITO on n-ZnMgSSe was determined to be about 0.65 eV. It was also found that we could achieve a photocurrent-to-dark current contrast higher than four orders of magnitude by applying a 10 V reverse bias. We also found that the maximum photoresponsivity at 400 nm is 0.27 A/W under a 5 V reverse bias. Such a value corresponds to an external quantum efficiency of 41.5%.
| 原文 | English |
|---|---|
| 頁(從 - 到) | L115-L117 |
| 期刊 | Japanese Journal of Applied Physics |
| 卷 | 41 |
| 發行號 | 2 A |
| DOIs | |
| 出版狀態 | Published - 2002 2月 1 |
All Science Journal Classification (ASJC) codes
- 一般工程
- 一般物理與天文學
指紋
深入研究「ZnMgSSe metal-semiconductor-metal visible-blind photodetectors with transparent indium-tin-oxide contact electrodes」主題。共同形成了獨特的指紋。引用此
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