ZnO-based multiple channel and multiple gate FinMOSFETs

Ching Ting Lee, Hung Lin Huang, Chun Yen Tseng, Hsin Ying Lee

研究成果: Conference contribution

摘要

In recent years, zinc oxide (ZnO)-based metal-oxide-semiconductor field-effect transistors (MOSFETs) have attracted much attention, because ZnO-based semiconductors possess several advantages, including large exciton binding energy, nontoxicity, biocompatibility, low material cost, and wide direct bandgap. Moreover, the ZnO-based MOSFET is one of most potential devices, due to the applications in microwave power amplifiers, logic circuits, large scale integrated circuits, and logic swing. In this study, to enhance the performances of the ZnO-based MOSFETs, the ZnObased multiple channel and multiple gate structured FinMOSFETs were fabricated using the simple laser interference photolithography method and the self-aligned photolithography method. The multiple channel structure possessed the additional sidewall depletion width control ability to improve the channel controllability, because the multiple channel sidewall portions were surrounded by the gate electrode. Furthermore, the multiple gate structure had a shorter distance between source and gate and a shorter gate length between two gates to enhance the gate operating performances. Besides, the shorter distance between source and gate could enhance the electron velocity in the channel fin structure of the multiple gate structure. In this work, ninety one channels and four gates were used in the FinMOSFETs. Consequently, the drain-source saturation current (IDSS) and maximum transconductance (gm) of the ZnO-based multiple channel and multiple gate structured FinFETs operated at a drain-source voltage (VDS) of 10 V and a gate-source voltage (VGS) of 0 V were respectively improved from 11.5 mA/mm to 13.7 mA/mm and from 4.1 mS/mm to 6.9 mS/mm in comparison with that of the conventional ZnO-based single channel and single gate MOSFETs.

原文English
主出版物標題Oxide-Based Materials and Devices VII
編輯David C. Look, Ferechteh H. Teherani, David J. Rogers
發行者SPIE
ISBN(電子)9781628419849
DOIs
出版狀態Published - 2016
事件Oxide-Based Materials and Devices VII - San Francisco, United States
持續時間: 2016 二月 142016 二月 17

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
9749
ISSN(列印)0277-786X
ISSN(電子)1996-756X

Other

OtherOxide-Based Materials and Devices VII
國家/地區United States
城市San Francisco
期間16-02-1416-02-17

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電腦科學應用
  • 應用數學
  • 電氣與電子工程

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