Fabrication and Optimisation of Fly’s Eye UV LED Homogenizer for DMDs

論文翻譯標題: DMDs均光照明系統優化與製作
  • 維 克拉姆

學生論文: Master's Thesis


Many applications in UV photolithography manufacturing like semiconductor lithography micro-machining micro-structuring or material analysis require a homogeneous intensity distribution of the UV light over its complete profile Periodic microlens arrays are widely used to transform Gaussian or non-uniform beam profile into a uniform “flat-top” Each microlens element samples the input beam and spreads it over a given angular distribution Incoherent beams that are either temporally or spatially incoherent can produce very uniform intensity profiles UV machining techniques are almost ubiquitous in industry for micro- to nanoscale fabrication It is essential for the advancement of the field that is faster and cheaper to processes Enhancements in speed and fidelity of production can be made to both additive and subtractive writing techniques by using Digital Micro Mirror Devices (DMD) A UV LED homogenizer is fabricated by the moulding process which can homogenize Intensity distribution of the non-collimated UV LED light source for Digital Micro Mirror Devices (DMDs) The PDMS Microlens arrays of sag height 100 μm are fabricated on the surface of Quartz plate which is thick as 10 mm An illumination system (upside down) has been developed which can produce the intensity distribution of homogenised UV LED light source The illumination system consists of UV LED light source three aspherical lenses Microlens homogenizer Fourier lens and energy metre connected to the pinhole power analyser The pinhole power analyser is fixed on the XY moving stage Finally the homogenized and collimated UV LED light source profile is recorded by the pinhole power analyser The recorded data is plotted and analysed in Matlab and then compared with the Zemax simulation results An integrated sphere is then used to analyse the power output of UV LED light power before homogenization and at the homogenization plane Energy efficiency is then calculated to compare with simulated results Measured uniformity of the flattop intensity profile is measured as ± 3 1 % experimentally
獎項日期2018 九月 5
監督員Yung-Chun Lee (Supervisor)