Particle-In-Cell Simulation of Asymmertic Secondary Electron Emission in Plasma Processing

  • 黃 俊維

學生論文: Master's Thesis

摘要

Simulating the electron behavior (without ion) in plasma for one-dimensional in the configuration space one-dimensional in the velocity space using Particle-in-Cell (PIC) method between two plates in asymmetric systems is investigated The secondary electron emission (SEE) effects which can make sheath potential is unstable discussed The PIC model takes into account of the self-consistent electric field By numerical simulation result it is found that increasing secondary electron emission coefficient γ makes plasma potential progressively small and finally the sheath potential disappear Furthermore different boundary condition for γ and potential Φ for two walls are given to make asymmetric system which generates a net current between two walls and affects their potential difference in short term It is found that the larger population of emitted electrons make the potential difference larger By a long term numerical simulation it is demonstrated that the plasma discharge is guaranteed to be stable as long as γ
獎項日期2014 十一月 4
原文English
監督員Yasutaro Nishimura (Supervisor)

引用此文

Particle-In-Cell Simulation of Asymmertic Secondary Electron Emission in Plasma Processing
俊維, 黃. (Author). 2014 十一月 4

學生論文: Master's Thesis